TOM 3 – Optical System Design and Tolerancing

Future trends in Optical Design with regard to Technology and Application

TOPICS

Topics include but are not limited to:

• Optical & optomechanical system design
• Tolerances
• Error budgeting
• Technological and manufacturing aspects
• Alignment strategies
• Digital correction means
• Cost considerations
• Standardization
• Including both imaging and non-imaging optics (with applications in lighting)

CHAIRS

• Chair: Wilhelm Ulrich, Carl Zeiss AG (DE)
• Co-chair: Kimio Tatsuno, Koga Research Institute Inc., Tokyo (JP)

PROGRAMME COMMITTEE

• Andrew Wood, Qioptiq (UK)
• Irina Livshits, NRU-ITMO, University of St. Petersburg (RU)
• Julius Muschaweck, ARRI (DE)
• Jyrki Kimmel, Nokia (FI)
• Kimio Tatsuno, Koga Research Institute Inc., Tokyo (JP)
• Rob Bates, Five Focal LLC (US)
• Ruben Mohedano, LPI (ES)
• Rung-Ywan Tsai, Industrial Technology Research Institute, Hsinchu (TW)
• Stefan Bäumer, TNO (NL)
• Wilbert Ijzermann, Philips Lighting (NL)
• Wilhelm Ulrich, Carl Zeiss AG (DE)
• Wolfgang Vollrath, KLA-Tencor (DE)
• Yasuhiro Ohmura, Nikon (JP)
• Yongtian Wang, Beijing Institute of Technology (CN)

PLENARY SPEAKER

• David Shafer, Shaferlens (US): The Evolution of a New High NA Broad Spectrum Catadioptric Design

INVITED SPEAKERS

• Alexander Epple, Carl Zeiss SMT AG (DE): Optics design with free form surfaces
• Alois Herkommer, Universität Stuttgart (DE): The Larange Invariant- a bridge between imaging and illumination design
• Andy Harvey, University of Glasgow (GB): Broadening the design focus with computational imaging
• Anurag Gupta, Google (US)
• Chir Weei Chang, Industrial Technology Research Institute, Hsinchu (TW): Optical design and tolerancing of plenoptical camera
• David Aikens, Savvy Optics (US): Overview about standardization in optics 
• Dewen Cheng & Yongtian Wang, Beijing Institute of Technology (CN): Optical design and evaluation of large-magnification and high-definition rigid endoscope
• Jan ten Thije Boonkkamp, Technical University of Eindhoven (NL): Monge-Ampere equation in illumination optics
• Jannick Rolland, University of Rochester (US): Design of a Manufacturable Freeform Three-Mirror Imaging Telescope
• John Rogers, Synopsys (US) 
• Keishi Kubo, Panasonic Corp. (JP): Metrology for Asphere and Freeform optics by UA3P
• Kevin Thompson, Synopsys (US)
• Koichi Takahashi,  Olympus Corp. Tokyo (JP): Optical Design for the wearable head mount display
• Massimiliano Pindo, TPI, Dresden (DE): Photomask challenges of EUV technology
• Oliver Dross, Philips Lighting (NL): Köhler integration in color mixing collimators
• Peter Brick, Osram (DE): Progress in High-luminance LEDs to benefit Etendue-critical Systems
• Stephan Berlitz, Audi AG (DE): Optics for car lighting application
• Takashi Inoue, Hamamatsu Photonics K.K. (JP): Wavefront control technology using spatial light modulator in bio and medical imaging
• Thomas Nobis, Carl Zeiss AG (DE): A surface-resolved approach for analysis and correction of secondary color 
• Toyohiko Yatagai, Utsunomiya University of Tokyo (JP): Optical mass storage based on polarization holography
• Willem Vos, University of Twente (NL): Scattering of light in LED’s
• Wolfgang Vollrath, KLA-Tencor (DE): Optical Design and Manufacturing Requirements for High- Performance Microscope Objectives
• Zenta Ushiyama, Tyco Corp. (JP): Optical design for illumination systems